コイケ　タカヨシ   KOIKE Takayoshi   小池　崇喜    所属   理工学部 総合理工学科    職種   特任准教授
言語種別	英語
発行・発表の年月	2006
形態種別	学術雑誌
査読	査読あり
標題	DNA damage photoinduced by cosmetic pigments and sunscreen agents under solar exposure and artificial UV illumination
執筆形態	共著
掲載誌名	Journal of Oleo Science
巻・号・頁	55(5),pp.249-261
著者・共著者	Hisao Hidaka, Hiroyuki Kobayashi, Takayoshi Koike, Tsugio Sato, Nick Serpone
概要	Nanostructured ZnO particles present in skin-care cosmetics and UVB/UVA sunscreen products generate strong oxidizing species (free radicals) when illuminated with UV radiation that can damages human skin and the horny layer. Damage to DNA by ZnO and other pigmentary ingredients in sunscreen formulations under artificial and solar UV exposure has been examd. by Agarose gel electrophoresis using pUC 18 DNA plasmids (2686 base-pairs). Initial photoinduced oxidative damage done to DNA plasmids have been probed by nicking assays under in vitro conditions for ZnO. The effects of nanosize ZnO and CeO2 particles, and the newly developed CaO-doped and SiO2-coated CeO2 pigment are compared when subjected to artificial (75-W Hg-lamp) and solar UV radiation. Supercoiled DNA plasmids undergo one nick to produce the relaxed form, followed by a second nick yielding the linear form of the plasmids.